Description

Vista 200

IR-PiFM – PiF-IR – AFM-IR
Sub 5 nm IR spatial resolution — Ultimate spectro-nanoscopy

Semiconductor-specific

• With a 200 mm × 200 mm sample stage Vista 200 is perfect for analyzing wafers or photo masks. Vista 200 can be configured with either a vacuum chuck with magnets or a specialized EUV mask holder. This instrument is perfect for 4-, 6-, or 8-in wafers.

Powerful yet non destructive

• PiFM operates in true non-contact mode. The instrument doesn’t touch your pristine samples, so they stay clean ­– and so does the tip.

Streamlined processes

• Our included data analysis software allows your team to go from measurements to presentation-ready results quickly. Tight integration with our data acquisition software allows you to get the answers you need in real time. Our scripting API allows custom recipes, and our files are open so integration with 3rd party software is easy.

Exceptional AFM performance

• With a 120 µm xy-scanner, 12 µm sample z-scanner, and integrated vibration isolation, our AFM is top notch. The high-bandwidth dual-z feedback system allows true non-contact AFM for IR PiFM.

Built for industry – Maximize efficiency, minimize disruption

• The 300 mm wide sample access door minimizes thermal disturbances that cause drift while allowing you to maximize throughput. With our forward moving stage and user friendly head mount, both the tip and sample can be easily swapped without opening the entire enclosure.

Self-contained system

• No need for a special environment. Vista 200 is complete with built in vibration isolation, a temperature controlled acoustic enclosure with 0.1 ºC precision, and a fully enclosed beam path with dry air.